Showing results 3 to 4 of 4
Issue Date | Title | Author(s) |
---|---|---|
- | Enhancement of Reconstructed Image by Noise Reduction for Mask Inspection of EUVL (Extreme Ultra-Violet Light) Lithography | Cho Jung-gyn; Cho Sung-jin; Park, Min-Chul; Jhon, Young Min; Byeong-Kwon Ju; Jung-Young Son |
- | Light Intensity Simulation in Real Space by Viewing Locations for Autostereoscopic Display Design | Cho Jung-gyn; Lee, Kwang-Hoon; Dong-Su Lee; Park, Min-Chul; Son, Jung-Young; Ju, Byeong-Kwon |