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Showing results 6 to 8 of 8

Issue DateTitleAuthor(s)
2001-03Improvement of the reliability of a Cu/W-N/SiOF multilevel interconnect by inserting plasma enhanced chemical vapor deposited W-N thin filmKim, DJ; Sim, HS; Lee, S; Kim, YT; Kim, SI; Park, JW
2003-08Metal oxide semiconductor field effect transistor characteristics with iridium gate electrode on atomic layer deposited ZrO2 high-k dielectricsYoum, M; Sim, HS; Jeon, H; Kim, SI; Kim, YT
2003-07Method to enhance atomic-layer deposition of tungsten-nitride diffusion barrier for Cu interconnectSim, HS; Kim, SI; Kim, YT
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