2001-02-02 | Measurement of sheath expansion in plasma source ion implantation | Kim, YW; Kim, GH; Han, S; Lee, Y; Cho, J; Rhee, SY |
1998-07-01 | Microstructure and fracture toughness of in-situ toughened SiC-TiC composites | Cho, KS; Choi, HJ; Lee, JG; Kim, YW |
1999-01 | Microstructure of silicon carbide with yttrium-aluminum garnet and silica | Kim, YW; Kim, JY; Mitomo, M; Zhan, GD; Lee, JG |
2003-01 | Nano- and microscale friction behaviors of functionalized self-assembled monolayers | Park, S; Kim, YW; Lim, JC; Ahn, HS; Park, SJ |
1999-12 | Oxidation behavior of hot-pressed Si3N4 with Re2O3 (Re = Y, Yb, Er, La) | Choi, HJ; Lee, JG; Kim, YW |
2002-09 | Oxidation behavior of liquid-phase sintered silicon carbide with aluminum nitride and rare-earth oxides (Re2O3 where Re=Y, Er, Yb) | Choi, HJ; Lee, JG; Kim, YW |
2001-04 | Plasma source ion implantation for ultrashallow junctions: Low energy and high dose rate | Cho, J; Han, S; Lee, Y; Kim, OK; Kim, GH; Kim, YW; Lim, H; Jung, HS |
2004-08-02 | Plasma source ion implantation using high-power pulsed RF plasma | Han, S; Lee, Y; Kim, YW; Kim, Y; Chun, H; Lee, J |
2001-05 | R-curve behavior of layered silicon carbide ceramics with surface fine microstructure | Cho, KS; Choi, HJ; Lee, JG; Kim, YW |
1997-10 | R-curve behavior of silicon nitride titanium nitride composites | Choi, HJ; Cho, KS; Lee, JG; Kim, YW |
2003-05 | Recrystallization and grain growth of cold-drawn gold bonding wire | Cho, JH; Cho, JS; Moon, JT; Lee, J; Cho, YH; Kim, YW; Rollett, AD; Oh, KH |
2000-11 | Refined continuum model on the behavior of intergranular films in silicon nitride ceramics | Choi, HJ; Kim, GH; Lee, JG; Kim, YW |
2005-11-01 | Si-based magnetic tunnel transistor with single CoFe base layer | Jang, SH; Kim, YW; Lee, JH; Kim, KY |
1996-12-01 | SiC-TiC and SiC-TiB2 composites densified by liquid-phase sintering | Cho, KS; Kim, YW; Choi, HJ; Lee, JG |
2001-04 | Slow crack growth behavior in Si3N4 sintered with Yb2Si2O7 tie-line composition additives | Choi, HJ; Kim, HJ; Lee, JG; Kim, YW |
2003-05-15 | Structural changes in the nano-oxide layer with annealing in specular spin valves | Jang, SH; Kim, YW; Kang, T; Kim, HJ; Kim, KY |
2003-11 | Surface characterization of biocompatible polysulfone membranes modified with poly(ethylene glycol) derivatives | Kim, YW; Kim, JJ; Kim, YH |
2002-08-01 | The effect of plasma exposure and annealing atmosphere on shallow junction formation using plasma source ion implantation | Cho, J; Han, S; Lee, Y; Kim, OK; Kim, GH; Kim, YW; Lim, H |
2004-10 | The effects of strained sapphire(0001) substrate on the structural quality of GaN epilayer | Cho, YS; Kim, J; Park, YJ; Na, HS; Kim, HJ; Kim, HJ; Yoon, E; Kim, YW |
2001-02-02 | The measurement of nitrogen ion species ratio in inductively coupled plasma source ion implantation | Cho, J; Han, S; Lee, Y; Kim, OK; Kim, GH; Kim, YW; Lim, H; Suh, M |
2004-08-02 | Time-resolved plasma measurement in a high-power pulsed ICP source for large area | Kim, YW; Jung, YD; Han, S; Lee, Y; Kim, GH |