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Showing results 1 to 2 of 2

Issue DateTitleAuthor(s)
1997-11Characteristics of a-Si:H films prepared by ECR CVD as a function of the H-2/SiH4Kang, MS; Kim, JY; Koo, YS; Lim, TH; Oh, IW; Jeon, BJ; Jung, IY; An, C
1997-11The characteristics before and after annealing of amorphous silicon films prepared by ECR plasma CVDKang, M; Kim, J; Lim, T; Oh, I; Jeon, B; Jung, I; An, C
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