Showing results 3 to 4 of 4
Issue Date | Title | Author(s) |
---|---|---|
1995-01 | Plasma effect in dielectric cap quantum well disordering using plasma enhanced chemical vapor deposited SiN capping layer. | 이석; W. J. Choi; J. Zhang; 김용; S. K. Kim; 이정일; 강광남; K. Cho |
- | Quantum well disordering by using plasma enhanced chemical vapor deposited SiN//x film as a capping layer. | KANG KWANG NHAM; W. J. Choi; S. Lee; Y. Kim; Lee Jung Il; S. K. Kim |