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Showing results 1 to 5 of 5

Issue DateTitleAuthor(s)
1991-01A new method to suppress encroachment by plasma deposited tungsten thin films.김용태; 민석기; 김충기
1990-01Characteristics of plasma enhanced chemical vapor deposition tungsten thin films.김용태; 민석기; 홍종성, et al
1990-01Effects of SiH//4 on resistivity of plasma enhanced chemical vapor deposition tungsten thin films.김용태; 민석기; 홍종성, et al
1991-01Highly conductive tungsten thin films prepared by the plasma assised silane reduction process.김용태; 민석기; 홍종성, et al
1991-01Plasma enhanced chemical vapor deposition of low-resistive tungsten thin films.김용태; 민석기; 홍종성, et al

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