Browsing by Author 김효겸

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Showing results 1 to 5 of 5

Issue DateTitleAuthor(s)
2002-01Comparison of TiN and TiAlN as a diffusion barrier deposited by atomic layer deposition김주영; 김효겸; 김양도, et al
2012-01Properties of Atomic Layer Deposited HfO2 Films on Ge Substrates Depending on Process Temperatures정형석; 김효겸; 유일혁, et al
2012-09Reduction of Charge Trapping in HfO2 Film on Ge Substrates by Atomic Layer Deposition of Various Passivating Interfacial Layers정형석; 유일혁; 김효겸, et al
2013-03The Electrical Properties of Asymmetric Schottky Contact Thin-Film Transistors with Amorphous-In2Ga2ZnO7라상호; 김언기; 정지심, et al
2012-07The Impact of Carbon Concentration on the Crystalline Phase and Dielectric Constant of Atomic Layer Deposited HfO2 Films on Ge Substrate정형석; 전상호; 김효겸, et al

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