| 1993-01 | Atomic force microscopic observation in the surface morphologies and roughness of plasma deposited tungsten and tungsten nitride thin films. | 김용태; C. S. Kwon; I. H. Choi, et al |
| 1996-01 | Defeat of GaN films on SiC(0001)with GaN buffer layers by MOCVD. | D. Byun; D. Lim; I. H. Choi, et al |
| 1995-01 | New concept for amorphous diffusion barrier: Ion beam modification of metal/semiconductor interface. | 김용태; S. K. Kwak; C. S. Kwon, et al |
| 1994-01 | Nitrogen implanted tungsten thin films for Cu diffusion barrier. | 김용태; D. J. Kim; C. S. Kwon, et al |
| 2012-07 | Riverbank filtration for water supply along River Nakdong, South Korea | S. K. Maeng; 송경근; I. H. Choi, et al |
| 1995-01 | The characteristics of nitrogen implanted tungsten film as a new diffusion barrier for metal organic chemical vapor deposited Cu metallization. | 김용태; 민석기; C. S. Kwon, et al |
| 1995-01 | The properties of nitrogen implanted tungsten diffusion barrier for Cu metallization. | 김용태; C. S. Kwon; D. J. Kim, et al |
| 1995-06 | The properties of nitrogen implanted tungsten diffusion barrier for Cu metallization. | 김용태; C. S. Kwon; D. J. Kim, et al |
