| 1998-02 | Annealing process of Pt/Ti/TiO2/polysilicon/Si3N4/Si-wafer using as a substrate of Pb(Zr0.53Ti0.47)O-3 thin films for piezoelectric microelectromechanical system devices. | Kim, JH; Yoon, YS; Polla, DL |
| 1998-03 | Characteristics of Pb(Zr0.53Ti0.47)O-3 films deposited by metalorganic decomposition on Pt/Ti/TiO2/polysilicon/Si3N4/Si for piezoelectric microelectromechanical system devices | Kim, JH; Yoon, YS; Polla, DL |
| 1998-02 | Fabrication and characteristics of microelectromechanical system device based on PZT films and surface micromachining | Yoon, YS; Kim, JH; Hsieh, MT; Polla, DL |
| 1997-01 | Fabrication process of PZT piezoelectric cantilever unimorphs using surface micromachining | Kim, JH; Wang, L; Zurn, SM; Li, L; Yoon, YS; Polla, DL |
| 1998-12 | Influence of interface structure on chemical etching process for air gap of microelectromechanical system based on surface micromachining | Yoon, YS; Kim, JH; Polla, DL; Shin, YH |
| 1998-12 | RuO2/Ru electrode on Si3N4/Si substrate for microelectromechanical systems devices based on Pb(Zr1-xTix)O-3 film and surface micromachining | Yoon, YS; Kim, JH; Schmidt, AM; Polla, DL; Wang, Q; Gladfelter, WL; Shin, YH |
| 2000-03-15 | Simulation and fabrication of piezoresistive membrane type MEMS strain sensors | Cao, L; Kim, TS; Mantell, SC; Polla, DL |
