Browsing byAuthorShin, J.-H.

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Issue DateTitleAuthor(s)
1998-01New single-component resists based on functional polynorborneneimides by chemical amplification for deep uv lithographyLee, C.-W.; Shin, J.-H.; Kang, J.-H.; Kim, J.-M.; Han, D.-K.; Ahn, K.-D.

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