Browsing by Author Tae Joo Park

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Showing results 1 to 6 of 6

Issue DateTitleAuthor(s)
2021-06Atomic-layer deposition of TiO2 thin films with a thermally stable (CpMe5)Ti(OMe)3 precursor김진상; 원성옥; 김성근, et al
2014-02Chemical Structures and Electrical Properties of Atomic layer deposited HfO2 Thin Films Grown at an Extremely Low Temperature (≤100 °C) Using O3 as an Oxygen SourceJeong Hwan Kim; Tae Joo Park; 김성근, et al
2016-01High quality interfacial sulfur passivation via H2S pre-deposition annealing for an atomic-layer-deposited HfO2 film on a Ge substrateTae Jun Seok; Young Jin Cho; Hyun Soo Jin, et al
2015-12Improved interface properties of atomic-layer-deposited HfO2 film on InP using interface sulfur passivation with H2S pre-deposition annealingHyun Soo Jin; Young Jin Cho; Tae Jun Seok, et al
2020-03Investigation of phases and chemical states of tin titanate films grown by atomic layer deposition원성옥; 김성근; 편정준, et al
2019-03Strategic Selection of the Oxygen Source for Low Temperature­Atomic Layer Deposition of Al2O3 Thin Film김성근; Hyun Soo Jin; Dae Hyun Kim, et al

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