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Issue DateTitleAuthor(s)
2005-04Effects of interfacial NH3/N2O-plasma treatment on the structural and electrical properties of ultra-thin HfO2 gate dielectrics on p-Si substratesMaikap, S; Lee, JH; Mahapatra, R; Pal, S; No, YS; Choi, WK; Ray, SK; Kim, DY
1

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