DSpace at KIST: Role of Hf in amorphous oxide thin film transistors fabricated by rf-magnetron sputtering

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DC Field	Value	Language
dc.contributor.author	Chong Eu Gene	-
dc.contributor.author	Chun Yoon Soo	-
dc.contributor.author	Jo Kyoungchul	-
dc.contributor.author	Kim Seung Han	-
dc.contributor.author	Jung Da Woon	-
dc.contributor.author	Lee Sang Yeol	-
dc.date.accessioned	2024-01-13T00:06:09Z	-
dc.date.available	2024-01-13T00:06:09Z	-
dc.date.created	2021-09-29	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/100175	-
dc.language	English	-
dc.subject	a-HIZO	-
dc.subject	oxide TFT	-
dc.subject	suppressor	-
dc.subject	transistor	-
dc.subject	threshold voltage	-
dc.title	Role of Hf in amorphous oxide thin film transistors fabricated by rf-magnetron sputtering	-
dc.title.alternative	스퍼터링 공정으로 제작된 비정질 산화물 박막트랜지스터의 하프늄 금속이온 영향	-
dc.type	Conference	-
dc.description.journalClass	2	-
dc.identifier.bibliographicCitation	전기전자재료학회 하계학술대회, pp.12	-
dc.citation.title	전기전자재료학회 하계학술대회	-
dc.citation.startPage	12	-
dc.citation.endPage	12	-
dc.citation.conferencePlace	KO	-

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