Influences of plasma treatment on the electrical characteristics of rf-magnetron sputtered BaTa2O6 thin films
- Influences of plasma treatment on the electrical characteristics of rf-magnetron sputtered BaTa2O6 thin films
- 김영식; 이윤희; 주병권; 성만영; 오명환
- FED; BaTa2O6 thin films; ACTFELD; Oxygen Plasma treatment; High dielectric donstant
- Issue Date
- 대한전기학회논문지 : 전기물성,응용부문 C; The Transactions of The Korean Institute of Electrical Engineers
- VOL 48C, NO 5, 319-325
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- KIST Publication > Article
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