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dc.contributor.authorSeongpil Chang-
dc.contributor.authorSe-Han Lee-
dc.contributor.authorSong, Yong-Won-
dc.contributor.authorJae-Hyeon Leem-
dc.contributor.authorJae-Hong Kwon-
dc.contributor.authorByeong-Kwon Ju-
dc.contributor.authorLee Sang Yeol-
dc.date.accessioned2024-01-13T04:31:50Z-
dc.date.available2024-01-13T04:31:50Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/102548-
dc.languageEnglish-
dc.titleZnO-Based Thin Film Transistors with Al2O3/HfO2/Al2O3 Structure-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationInternational Symposium on the Physics of Semiconductor Applications(ISPSA) - 2008, pp.219-
dc.citation.titleInternational Symposium on the Physics of Semiconductor Applications(ISPSA) - 2008-
dc.citation.startPage219-
dc.citation.endPage219-
dc.citation.conferencePlaceKO-
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