DSpace at KIST: Copper Electrodeposition for Semiconductor Interconnection

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DC Field	Value	Language
dc.contributor.author	Soo-Kil Kim	-
dc.contributor.author	Jae Jeong Kim	-
dc.date.accessioned	2024-01-13T06:00:54Z	-
dc.date.available	2024-01-13T06:00:54Z	-
dc.date.created	2021-09-29	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/103283	-
dc.language	English	-
dc.subject	반도체	-
dc.subject	금속배선	-
dc.subject	구리	-
dc.subject	전해도금	-
dc.title	Copper Electrodeposition for Semiconductor Interconnection	-
dc.title.alternative	반도체 금속 배선용 구리 전해 도금	-
dc.type	Conference	-
dc.description.journalClass	2	-
dc.identifier.bibliographicCitation	한국전기화학회, pp.13	-
dc.citation.title	한국전기화학회	-
dc.citation.startPage	13	-
dc.citation.endPage	13	-
dc.citation.conferencePlace	KO	-

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