Enhancement of ferroelectric properties of SrBi2Nb2O9 thin films by oxygen plasma rapid thermal annealing

Authors
KIM IK SOOYoung Mi KimKim, Yong TaeKim, Seong IlIn-Hoon Choi
Citation
The 11th Korean Conference on Semiconductors, v.2, pp.447 - 448
URI
https://pubs.kist.re.kr/handle/201004/105567
Appears in Collections:
KIST Conference Paper > Others
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