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Influence of the process parameters on the surface resistance of Cu/C films on polymer substrates prepared at ambient temperature by ECR-chemical vapor deposition.

Authors

Lee Joong Kee; JEON BUP JU; 고형덕; Byun Dongjin; Park Dal keun

Citation

17th International Symposium on Chemical Reaction Engineering, pp.MS# 0150

Keywords

ECR-MOCVD

URI

https://pubs.kist.re.kr/handle/201004/106723

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KIST Conference Paper > Others

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