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Pulse plasma enhanced atomic layer deposition of tungsten nitride thin film

Authors

Kim Yong Tae

Citation

2002 대한금속·재료학회 춘계학술대회, pp.47

Keywords

pulse plasma; PPALD; WF6; NH3; 1000마이크로오옴; 저저항; Cu확산방지

URI

https://pubs.kist.re.kr/handle/201004/106981

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KIST Conference Paper > Others

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