Effect of flow rate ratios of SiH//4/NH//3/N//2 and SiH//4/NH//3/Ar on the properties of PECVD SiN//x:H films.

Title
Effect of flow rate ratios of SiH//4/NH//3/N//2 and SiH//4/NH//3/Ar on the properties of PECVD SiN//x:H films.
Authors
김용태김춘근민석기
Issue Date
1988-01
Publisher
J. Kor. inst. telem. elec.
Citation
v. 25, 490-494
URI
http://pubs.kist.re.kr/handle/201004/10784
Appears in Collections:
KIST Publication > Article
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