DSpace at KISTKIST Conference PaperOthers

Full metadata record

DC Field Value Language
dc.contributor.author조정희-
dc.contributor.authorHAN SEUNG HEE-
dc.contributor.authorLEE YEON HEE-
dc.contributor.author김옥경-
dc.contributor.author김곤호-
dc.contributor.author황현상-
dc.contributor.author김영우-
dc.contributor.authorLIM HYUN EUI-
dc.contributor.authorJUNG, HYE SUN-
dc.contributor.author백성권-
dc.date.accessioned2024-01-13T15:04:28Z-
dc.date.available2024-01-13T15:04:28Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/108278-
dc.languageEnglish-
dc.subjectshallow junction-
dc.subjectPSII-
dc.subjectrapid thermal annealer-
dc.titlePlasma source ion implantations for shallow junction-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitation제19회 한국진공학회 학술발표회, pp.49-
dc.citation.title제19회 한국진공학회 학술발표회-
dc.citation.startPage49-
dc.citation.endPage49-
dc.citation.conferencePlaceKO-
Appears in Collections:
KIST Conference Paper > Others
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML
Show Simple Item Record

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE