Effects of voltage distribution in Pt/SrBi2Ta2O9/Ta2O5/Si structure on memory window of ferroelectric gate

Authors
Kim, Yong Tae최훈상박건상최인훈
Citation
12th IEEE International Symposium on Applications of Ferroelectrics
Keywords
SrBi2Ta2O9
URI
https://pubs.kist.re.kr/handle/201004/108303
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KIST Conference Paper > Others
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