Review of modified direct current plasma assisted chemical vapour deposition method(DC PACVD) for wafer scale free standing diamond film

Authors
Baik Young JoonLEE JAE KAPLee Wook SeongEUN KWANG YONG
Citation
The Int. Conf. On Metallurgical Coatings and Thin Films, April 10-14, 2000, San Diego, California, U, pp.?
Keywords
CVD diamond
URI
https://pubs.kist.re.kr/handle/201004/108488
Appears in Collections:
KIST Conference Paper > Others
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