Full metadata record

DC Field Value Language
dc.contributor.authorLEE KWAN HYI-
dc.contributor.authorLee Hwa Yung-
dc.contributor.authorJeung Won Young-
dc.date.accessioned2024-01-13T16:00:33Z-
dc.date.available2024-01-13T16:00:33Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/108591-
dc.languageEnglish-
dc.subject구리전착-
dc.subject균일전류밀도분포-
dc.subject다공성 그물구조 전극-
dc.titleElectrodeposition of copper on retic ular structure cathode I. Effect of cupric ion concentration-
dc.title.alternative다공성 그물구조 음극을 이용한 구리 전착 I. 전해질 중의 구리 이온 농도의 영향-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitation한국전기화학회 2000년 춘계학술발표회 초록집, pp.21-
dc.citation.title한국전기화학회 2000년 춘계학술발표회 초록집-
dc.citation.startPage21-
dc.citation.endPage21-
dc.citation.conferencePlaceKO-
Appears in Collections:
KIST Conference Paper > Others
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE