Plasma source ion implantations for shallow p+/n junction

Authors
조정희HAN SEUNG HEELEE YEON HEE김옥경김곤호김영우LIM HYUN EUISUH MOO JIN
Citation
제18회 한국진공학회 학술발표회, pp.180
Keywords
plasma source ion implantation; shallow p+/n junction; electrical characteristics
URI
https://pubs.kist.re.kr/handle/201004/108621
Appears in Collections:
KIST Conference Paper > Others
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