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dc.contributor.author고의관-
dc.contributor.authorPark Young Ju-
dc.contributor.authorKIM EUN KYU-
dc.contributor.authorPARK CHAN-SOO-
dc.contributor.author이석현-
dc.contributor.author이정희-
dc.contributor.author조성호-
dc.date.accessioned2024-01-13T16:31:25Z-
dc.date.available2024-01-13T16:31:25Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/108912-
dc.languageEnglish-
dc.subjectGaN-
dc.titleA study of GaN characteristics affected by stress existing in N+-implanted Si(111) substrate-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitationProc. 7th Korean Conf. on Semiconductors = 제 7 회 한국반도체 학술대회, pp.507 - 508-
dc.citation.titleProc. 7th Korean Conf. on Semiconductors = 제 7 회 한국반도체 학술대회-
dc.citation.startPage507-
dc.citation.endPage508-
dc.citation.conferencePlaceKO-
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