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dc.contributor.authorAhn Kwang-Duk-
dc.date.accessioned2024-01-13T17:01:47Z-
dc.date.available2024-01-13T17:01:47Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/109202-
dc.languageEnglish-
dc.titleAlicyclic polymers based on t-BOC norbornene derivatives and maleic anhydride for applications as ArF photoresists-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitation2nd Asian Photochemistry Conference, pp.103 - 104-
dc.citation.title2nd Asian Photochemistry Conference-
dc.citation.startPage103-
dc.citation.endPage104-
dc.citation.conferencePlaceKO-
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