Growth and characterization of silicon nitride films by PECVD.

Title
Growth and characterization of silicon nitride films by PECVD.
Authors
강광남이정일J. H. Jo한일기Y. J. Lee
Keywords
silicon nitride films
Issue Date
1990-01
Publisher
5th ICSFS, Brown U., Providence, USA, Aug. 13-17, 1990
Citation
, ?-?
URI
http://pubs.kist.re.kr/handle/201004/10921
Appears in Collections:
KIST Publication > Conference Paper
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