Highly conductive tungsten thin films prepared by the plasma assised silane reduction process.

Title
Highly conductive tungsten thin films prepared by the plasma assised silane reduction process.
Authors
김용태민석기홍종성김충기
Issue Date
1991-01
Publisher
Jpn. j. appl. phys.
Citation
v. 30, 820-826
URI
http://pubs.kist.re.kr/handle/201004/10971
Appears in Collections:
KIST Publication > Article
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