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dc.contributor.author김용태-
dc.contributor.author민석기-
dc.contributor.author홍종성-
dc.contributor.author김충기-
dc.date.accessioned2015-12-02T04:56:51Z-
dc.date.available2015-12-02T04:56:51Z-
dc.date.issued199101-
dc.identifier.citationv. 30, 820-826-
dc.identifier.other2100-
dc.identifier.urihttp://pubs.kist.re.kr/handle/201004/10971-
dc.publisherJpn. j. appl. phys.-
dc.titleHighly conductive tungsten thin films prepared by the plasma assised silane reduction process.-
dc.typeArticle-
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