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Improvement in diffusion barrier properties of PECVD W-N thin film by low energy BF2+ implantation

Authors

김동준; Kim Yong Tae; PARK YOUNG KYUN; 심현상; 박종완

Citation

Proc. of EOS/SPIE Symposium on Microelectronic Manufacturing Technologies

Keywords

PECVD; W-N; BF2+ implantation; diffusion barrier

URI

https://pubs.kist.re.kr/handle/201004/109830

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KIST Conference Paper > Others

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