Rapid thermal annealing effects on the properties of plasma-enhanced chemical vapor deposited tungsten films.

Title
Rapid thermal annealing effects on the properties of plasma-enhanced chemical vapor deposited tungsten films.
Authors
김용태민석기홍종성강태원홍치유
Issue Date
1991-01
Publisher
J. appl. phys.
Citation
v. 70, 2366-2369
URI
http://pubs.kist.re.kr/handle/201004/10994
Appears in Collections:
KIST Publication > Article
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