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dc.contributor.authorKIM SEOK IL-
dc.contributor.author정석구-
dc.contributor.author최범호-
dc.contributor.author현찬경-
dc.contributor.authorKIM EUN KYU-
dc.contributor.authorMin Suk-Ki-
dc.contributor.author황성우-
dc.date.accessioned2024-01-13T19:01:27Z-
dc.date.available2024-01-13T19:01:27Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/110247-
dc.languageEnglish-
dc.subjectResitless nanometer patterning of SiO ₂ with electron beam irradiation-
dc.titleResistless nanometer patterning of SiO₂ with electron beam irradiation-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitation제 5 회 한국반도체학술대회, pp.585 - 586-
dc.citation.title제 5 회 한국반도체학술대회-
dc.citation.startPage585-
dc.citation.endPage586-
dc.citation.conferencePlaceKO-
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