Growth of g-Al2O3 thin films on Si by low-pressure metalorganic chemical vapor deposition

Title
Growth of g-Al2O3 thin films on Si by low-pressure metalorganic chemical vapor deposition
Authors
염상섭윤영수W. N. KangJ. I. LeeD. J. ChoiT. W. KimK. Y. SeoP. H. HurC. Y. Kim
Keywords
thin films; Al2O3; MOCVD
Issue Date
1992-01
Publisher
Thin solid films
Citation
VOL 213, 72-75
URI
http://pubs.kist.re.kr/handle/201004/11094
Appears in Collections:
KIST Publication > Article
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