The effect of diluent gas and rapid thermal annealing on the properties of plasma deposited silicon nitride films.

Title
The effect of diluent gas and rapid thermal annealing on the properties of plasma deposited silicon nitride films.
Authors
김용태민석기남철우우성일
Issue Date
1992-01
Publisher
Thin solid films
Citation
v. 209, 215-222
URI
http://pubs.kist.re.kr/handle/201004/11101
Appears in Collections:
KIST Publication > Article
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