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dc.contributor.authorS. Lim-
dc.contributor.authorS. J. Kim-
dc.contributor.authorJung Jae Hoon-
dc.contributor.authorJu Byeong Kwon-
dc.contributor.authorOH MYUNG HWAN-
dc.contributor.authorJ. F. Wager-
dc.date.accessioned2024-01-13T21:02:38Z-
dc.date.available2024-01-13T21:02:38Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/111374-
dc.languageEnglish-
dc.subjectinsulating film-
dc.subjectfield emission display-
dc.titleHigh quality silicon-nitride thin films grown by helium plasma-enhanced chemical vapor deposition-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationTechnical digest of 9th international vacuum microelectronics conference, St. Petersburg, Russia., pp.406 - 410-
dc.citation.titleTechnical digest of 9th international vacuum microelectronics conference, St. Petersburg, Russia.-
dc.citation.startPage406-
dc.citation.endPage410-
dc.citation.conferencePlaceKO-
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