A low temperature direct bonding method using an electron-beam evaporated silicon-oxide interlayer

Authors
Ju Byeong KwonLEE YUN HIOH MYUNG HWANH. W. ParkJ. H. ParkN. Y. LeeK. H. KohD. K. ShinI. B. KangN. SamaanM. R. Haskard
Citation
MRS 1996 fall meeting, Boston, USA., pp.?
Keywords
MEMS
URI
https://pubs.kist.re.kr/handle/201004/111457
Appears in Collections:
KIST Conference Paper > Others
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