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Low temperature preparation of SiO2 films with low interface trap density using diffusion and CVD method

Authors

JEON BUP JU; Lim Tae Hoon; Oh In Hwan

Citation

IEEE conference on optoelectronic and microelectronic materials and devices, Canberra, Australia

URI

https://pubs.kist.re.kr/handle/201004/111628

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KIST Conference Paper > Others

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