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Performance characteristics of the PMS SAS-3600 wafer surface scanner.

Authors

채승기; Benjamin Y. H. Liu; Bae Gwi-Nam; MYONG HYON KOOK; Chun-Sik Lee

Citation

Proceedings of the 39th annual technical meeting of the IES., v.v. 1, pp.336 - 344

Keywords

wafer surface scanner; light scattering; microcontamination; particles; silicon wafers

URI

https://pubs.kist.re.kr/handle/201004/112320

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KIST Conference Paper > Others

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