Effect of residual gas on Cu film deposition by partially ionized beam

Title
Effect of residual gas on Cu film deposition by partially ionized beam
Authors
고석근Zhegao Jin이지연정형진김기환최두진
Keywords
copper film; residual gas; deposition
Issue Date
1995-01
Publisher
Journal of vacuum science & technology. A, Vacuum, surfaces, and films : an official journal of the American Vacuum Society
Citation
VOL 13, NO 4, 2123-2127
URI
http://pubs.kist.re.kr/handle/201004/11441
ISSN
0734-2101
Appears in Collections:
KIST Publication > Article
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