Solid-phase epitaxial regrowth and dopant activation of arsenic-implanted metastable pseudomorphic Ge0.08Si0.92 and Ge0.16Si0.84 on Si(100)

Title
Solid-phase epitaxial regrowth and dopant activation of arsenic-implanted metastable pseudomorphic Ge0.08Si0.92 and Ge0.16Si0.84 on Si(100)
Authors
D.Y.C. Lie송종한M.-A. NicoletM.O. TannerS. ThomasK.L. Wang
Issue Date
1995-01
Publisher
Material Research Society Symposium Proceedings
Citation
VOL 379, 467-472
URI
http://pubs.kist.re.kr/handle/201004/11496
Appears in Collections:
KIST Publication > Conference Paper
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