Selective etching characteristics of ITO/semiconductor and ITO/BaTiO//3 structures by reactive ion etching.

Title
Selective etching characteristics of ITO/semiconductor and ITO/BaTiO//3 structures by reactive ion etching.
Authors
강광남이정일한일기이윤희김회종이석오명환김선호박홍이
Keywords
reactive ion etching
Issue Date
1995-01
Publisher
전자공학회논문집 A
Citation
v. 32, no. 1, 152-?
URI
http://pubs.kist.re.kr/handle/201004/11552
Appears in Collections:
KIST Publication > Article
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