Etching characteristics of magnetic thin films by ion beam technique.

Title
Etching characteristics of magnetic thin films by ion beam technique.
Authors
이환철김성동임상호한석희김희중강일구
Keywords
etching; magnetic thin film; ion beam technique; etch rate
Issue Date
1995-10
Publisher
한국자기학회지; Journal of Korean Magnetics Society
Citation
v. 5, no. 5, 538-542
URI
http://pubs.kist.re.kr/handle/201004/11556
ISSN
1017-7701
Appears in Collections:
KIST Publication > Article
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