Electrical characteristics of silicon oxide films prepared by chemical vapor deposition method using ECR plama sources.

Title
Electrical characteristics of silicon oxide films prepared by chemical vapor deposition method using ECR plama sources.
Authors
전법주허정수윤용수정일현오인환임태훈
Issue Date
1996-01
Publisher
Theories and applications of chem. res.
Citation
v. 2, no. 2, 2523-?
URI
http://pubs.kist.re.kr/handle/201004/11719
Appears in Collections:
KIST Publication > Conference Paper
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