Low temperature preparation of SiO2 films with low interface trap density using diffusion and CVD method

Title
Low temperature preparation of SiO2 films with low interface trap density using diffusion and CVD method
Authors
전법주임태훈오인환
Issue Date
1996-01
Publisher
IEEE conference on optoelectronic and microelectronic materials and devices, Canberra, Australia
URI
http://pubs.kist.re.kr/handle/201004/11748
Appears in Collections:
KIST Publication > Conference Paper
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