Highly Enhanced Curie Temperature in Ga-Implanted Fe3GeTe2 van der Waals Material

Authors
Yang, M.Li, Q.Chopdekar, R.V.Stan, C.Cabrini, S.Choi, J.W.Wang, S.Wang, T.Gao, N.Scholl, A.Tamura, N.Hwang, C.Wang, F.Qiu, Z.
Issue Date
2020-04
Publisher
Wiley-VCH Verlag
Citation
Advanced Quantum Technologies, v.3, no.4
Abstract
Among many efforts in the research of van der Waals (vdW) magnetic materials, increasing the Curie temperature above room temperature has been at the center of research in developing spintronics technology using vdW materials. Here an effective and reliable method of increasing the Curie temperature of ferromagnetic Fe3GeTe2 vdW materials by Ga implantation is reported. It is found that implanting Ga into Fe3GeTe2 by the amount of 10?3 Ga ??3 could greatly enhance the Fe3GeTe2 Curie temperature by almost 100%. Spatially resolved microdiffraction and element-resolved X-ray absorption spectroscopy show little changes in the Fe3GeTe2 crystal structure and Fe valence state. In addition, the Ga implantation changes the Fe3GeTe2 magnetization from out-of-plane direction at low temperature to in-plane direction at high temperature. The result opens a new opportunity for tailoring the magnetic properties of vdW materials beyond room temperature. ? 2020 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Keywords
Iron metallography; Magnetic materials; Tellurium compounds; Temperature; Van der Waals forces; X ray absorption spectroscopy; High temperature; In-plane direction; Low temperatures; Microdiffractions; Out-of-plane direction; Reliable methods; Spatially resolved; Van der waals; Tungsten compounds; Crystal structure; Curie temperature; Gallium; Germanium compounds; Curie temperature enhancement; Ga implantation; photoemission electron microscopy; van der Waals magnetism
ISSN
2511-9044
URI
https://pubs.kist.re.kr/handle/201004/118832
DOI
10.1002/qute.202000017
Appears in Collections:
KIST Article > 2020
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