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dc.contributor.authorChee, Sang-Soo-
dc.contributor.authorLee, Won-June-
dc.contributor.authorJo, Yong-Ryun-
dc.contributor.authorCho, Min Kyung-
dc.contributor.authorChun, DongWon-
dc.contributor.authorBaik, Hionsuck-
dc.contributor.authorKim, Bong-Joong-
dc.contributor.authorYoon, Myung-Han-
dc.contributor.authorLee, Kayoung-
dc.contributor.authorHam, Moon-Ho-
dc.date.accessioned2024-01-19T18:02:54Z-
dc.date.available2024-01-19T18:02:54Z-
dc.date.created2021-09-04-
dc.date.issued2020-03-
dc.identifier.issn1616-301X-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/118924-
dc.description.abstractDefect engineering of 2D transition metal dichalcogenides (TMDCs) is essential to modulate their optoelectrical functionalities, but there are only a few reports on defect-engineered TMDC device arrays. Herein, the atomic vacancy control and elemental substitution in a chemical vapor deposition (CVD)-grown molybdenum disulfide (MoS2) monolayer via mild photon irradiation under controlled atmospheres are reported. Raman spectroscopy, photoluminescence, X-ray, and ultraviolet photoelectron spectroscopy comprehensively demonstrate that the well-controlled photoactivation delicately modulates the sulfur-to-molybdenum ratio as well as the work function of a MoS2 monolayer. Furthermore, the atomic-resolution scanning transmission electron microscopy directly confirms that small portions (2-4 at% corresponding to the defect density of 4.6 x 10(12) to 9.2 x 10(13) cm(-2)) of sulfur vacancies and oxygen substituents are generated in the MoS2 while the overall atomic-scale structural integrity is well preserved. Electronic and optoelectronic device arrays are also realized using the defect-engineered CVD-grown MoS2, and it is further confirmed that the well-defined sulfur vacancies and oxygen substituents effectively give rise to the selective n- and p-doping in the MoS2, respectively, without the trade-off in device performance. In particular, low-percentage oxygen-doped MoS2 devices show outstanding optoelectrical performance, achieving a detectivity of approximate to 10(13) Jones and rise/decay times of 0.62 and 2.94 s, respectively.-
dc.languageEnglish-
dc.publisherWILEY-V C H VERLAG GMBH-
dc.subjectCHEMICAL-VAPOR-DEPOSITION-
dc.subjectFEW-LAYER MOS2-
dc.subjectPLASMA-
dc.subjectPHOTODETECTOR-
dc.subjectENHANCEMENT-
dc.subjectGROWTH-
dc.titleAtomic Vacancy Control and Elemental Substitution in a Monolayer Molybdenum Disulfide for High Performance Optoelectronic Device Arrays-
dc.typeArticle-
dc.identifier.doi10.1002/adfm.201908147-
dc.description.journalClass1-
dc.identifier.bibliographicCitationADVANCED FUNCTIONAL MATERIALS, v.30, no.11-
dc.citation.titleADVANCED FUNCTIONAL MATERIALS-
dc.citation.volume30-
dc.citation.number11-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000510022100001-
dc.identifier.scopusid2-s2.0-85078838194-
dc.relation.journalWebOfScienceCategoryChemistry, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryChemistry, Physical-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusCHEMICAL-VAPOR-DEPOSITION-
dc.subject.keywordPlusFEW-LAYER MOS2-
dc.subject.keywordPlusPLASMA-
dc.subject.keywordPlusPHOTODETECTOR-
dc.subject.keywordPlusENHANCEMENT-
dc.subject.keywordPlusGROWTH-
dc.subject.keywordAuthordefect engineering-
dc.subject.keywordAuthorelemental substitution-
dc.subject.keywordAuthormolybdenum disulfides-
dc.subject.keywordAuthortransition metal dichalcogenides-
dc.subject.keywordAuthorvacancy control-
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