The characteristics before and after annealing of amorphous silicon films prepared by ECR plasma CVD

Title
The characteristics before and after annealing of amorphous silicon films prepared by ECR plasma CVD
Authors
강문상김재영임태훈오인환전법주정일현안철
Keywords
ECR CVD; a-Si:H film; annealing; poly silicon
Issue Date
1997-11
Publisher
Journal of non-crystalline solids
Citation
VOL 221, NO 1, 103-105
URI
http://pubs.kist.re.kr/handle/201004/12162
ISSN
0022-3093
Appears in Collections:
KIST Publication > Article
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