Interfacial Energy-Controlled Top Coats for Gyroid/Cylinder Phase Transitions of Polystyrene-block-polydimethylsiloxane Block Copolymer Thin Films

Authors
Ryu, In HyuKim, Yong JooJung, Yeon SikLim, Jong SungRoss, Caroline A.Son, Jeong Gon
Issue Date
2017-05-24
Publisher
American Chemical Society
Citation
ACS Applied Materials & Interfaces, v.9, no.20, pp.17428 - 17435
Abstract
Block copolymers (BCPs) with a high Flory-Huggins interaction parameter (chi) can form well-defined sub-10 nm periodic structures and can be used as a template for fabrication of various functional nanostructures. However, the large difference of surface energy between the blocks commonly found in high-chi BCPs makes it challenging to stabilize a useful gyroid morphology in thin film form. Here, we used an interfacial-energy-tailored top-coat on a blended film of a polystyrene-block-polydimethylsiloxane (PS-b-PDMS) BCP and a low-molecular-weight PDMS homopolymer with a hydrophilic end functional group. The top coat consisted of a random mixture of 40% hydrolyzed poly(vinyl acetate)-random-poly(vinly alcohol) (PVA-r-PVAc, PVA40) and PVAc homopolymer. At the optimized top-coat composition, gyroid nanostructures with sub-10 nm strut width were achieved down to similar to 125 nm film thickness, which is only 3 times the lattice parameter of the gyroid structure. This is in marked contrast with a mixed morphology of gyroid and cylinders obtained for other compositions of the top coat. Self-consistent field theoretic simulations were used to understand the effect of the interfacial energy between the top coat and BCP/homopolymer blends on the phase transition behavior of the BCP/homopolymer films.
Keywords
PERPENDICULAR ORIENTATION; SOLVENT EVAPORATION; INDUCED ALIGNMENT; SURFACE-TENSION; LITHOGRAPHY; POLYMERS; DOMAINS; BLENDS; NANOLITHOGRAPHY; NANOSTRUCTURES; PERPENDICULAR ORIENTATION; SOLVENT EVAPORATION; INDUCED ALIGNMENT; SURFACE-TENSION; LITHOGRAPHY; POLYMERS; DOMAINS; BLENDS; NANOLITHOGRAPHY; NANOSTRUCTURES; gyroid thin film; block copolymer self-assembly; sub-10 nm patterning; top coat; phase transition; SCFT simulation
ISSN
1944-8244
URI
https://pubs.kist.re.kr/handle/201004/122724
DOI
10.1021/acsami.7b02910
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KIST Article > 2017
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