Characteristics of silicon oxide films prepared by chemical vapor deposition using ECR plasma source

Title
Characteristics of silicon oxide films prepared by chemical vapor deposition using ECR plasma source
Authors
오인환전법주임태훈정일현
Keywords
electron cyclotron resonance; chemical vapor deposition; microwave power
Issue Date
1997-07
Publisher
화학공학; Journal of the Korean institute of chemical engineers
Citation
VOL 35, NO 3, 374-379
URI
http://pubs.kist.re.kr/handle/201004/12279
Appears in Collections:
KIST Publication > Article
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